Kinetic analysis of the chemical processes in the decomposition of gaseous dielectrics by a non-equilibrium plasma - part 2: SF6 and SF6/O2
In this work, a numerical modelling analysis of the gas-phase decomposition of pure SF6 and SF6/O2 mixtures, in the presence of silicon was performed. The relative rate of individual processes, the effect of the parameters uncertainties and the sensitivity coefficients were determined. The results w...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Sociedade Brasileira de Química
2000-01-01
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| Series: | Journal of the Brazilian Chemical Society |
| Subjects: | |
| Online Access: | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532000000200005 |