Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography
<p>Abstract</p> <p>In this research, nanoimprint lithography (NIL) was used for patterning crystalline zinc oxide (ZnO) nanorods on the silicon substrate. To fabricate nano-patterned ZnO nanorods, patterning of an <it>n</it>-octadecyltrichlorosilane (OTS) self-assembled...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2011-01-01
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| Series: | Nanoscale Research Letters |
| Online Access: | http://www.nanoscalereslett.com/content/6/1/159 |