The Process of Plasma Chemical Photoresist Film Ashing from the Surface of Silicon Wafers
At present, the research for finding new technical methods of treating materials with plasma, including the development of energy and resource saving technologies for microelectronic manufacturing, is particularly actual.In order to improve the efficiency of microwave plasma chemical ashing of photo...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
CTU Central Library
2013-01-01
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| Series: | Acta Polytechnica |
| Subjects: | |
| Online Access: | https://ojs.cvut.cz/ojs/index.php/ap/article/view/1725 |