Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films

We report the thickness-dependent strain-relaxation behavior and the associated impacts upon the superconductivity in epitaxial La1.85Sr0.15CuO4 films grown on different substrates, which provide a range of strain. We have found that the critical thickness for the onset of superconductivity in La1.8...

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Main Authors: T. L. Meyer, L. Jiang, S. Park, T. Egami, H. N. Lee
Format: Article
Language:English
Published: AIP Publishing LLC 2015-12-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.4937170
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spelling doaj-8f0cd7344c6f4ddeab7fad39cf003d9a2020-11-24T22:18:43ZengAIP Publishing LLCAPL Materials2166-532X2015-12-01312126102126102-610.1063/1.4937170004512APMStrain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 filmsT. L. Meyer0L. Jiang1S. Park2T. Egami3H. N. Lee4Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USAMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USAMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USAMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USAMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USAWe report the thickness-dependent strain-relaxation behavior and the associated impacts upon the superconductivity in epitaxial La1.85Sr0.15CuO4 films grown on different substrates, which provide a range of strain. We have found that the critical thickness for the onset of superconductivity in La1.85Sr0.15CuO4 films is associated with the finite thickness effect and epitaxial strain. In particular, thin films with tensile strain greater than ∼0.25% revealed no superconductivity. We attribute this phenomenon to the inherent formation of oxygen vacancies that can be minimized via strain relaxation.http://dx.doi.org/10.1063/1.4937170
collection DOAJ
language English
format Article
sources DOAJ
author T. L. Meyer
L. Jiang
S. Park
T. Egami
H. N. Lee
spellingShingle T. L. Meyer
L. Jiang
S. Park
T. Egami
H. N. Lee
Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
APL Materials
author_facet T. L. Meyer
L. Jiang
S. Park
T. Egami
H. N. Lee
author_sort T. L. Meyer
title Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
title_short Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
title_full Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
title_fullStr Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
title_full_unstemmed Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
title_sort strain-relaxation and critical thickness of epitaxial la1.85sr0.15cuo4 films
publisher AIP Publishing LLC
series APL Materials
issn 2166-532X
publishDate 2015-12-01
description We report the thickness-dependent strain-relaxation behavior and the associated impacts upon the superconductivity in epitaxial La1.85Sr0.15CuO4 films grown on different substrates, which provide a range of strain. We have found that the critical thickness for the onset of superconductivity in La1.85Sr0.15CuO4 films is associated with the finite thickness effect and epitaxial strain. In particular, thin films with tensile strain greater than ∼0.25% revealed no superconductivity. We attribute this phenomenon to the inherent formation of oxygen vacancies that can be minimized via strain relaxation.
url http://dx.doi.org/10.1063/1.4937170
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AT ljiang strainrelaxationandcriticalthicknessofepitaxialla185sr015cuo4films
AT spark strainrelaxationandcriticalthicknessofepitaxialla185sr015cuo4films
AT tegami strainrelaxationandcriticalthicknessofepitaxialla185sr015cuo4films
AT hnlee strainrelaxationandcriticalthicknessofepitaxialla185sr015cuo4films
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