CLEANING AND SPUTTERING USING PLANAR ACOUSTOPLASMA MAGNETRON

CLEANING AND SPUTTERING USING PLANAR ACOUSTOPLASMA MAGNETRON

The paper describes the obtained experimental results for a planar acoustoplasma magnetron. The small radius of the anode loopallows focusing and accelerating the ionic component of the sprayed material.Argon was used as a buffer gas. The characteristics of the magnetron in case of direct current su...

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Bibliographic Details
Main Authors: A.S. Abrahamyan, A.H. Mkrtchyan, V.V. Nalbandyan, H.T. Hovhannisyan, R.Yu. Chilingaryan, A.S. Hakobyan, P.H. Mossoyan
Format: Article
Language:English
Published: Tomsk Polytechnic University 2018-03-01
Series:Resource-Efficient Technologies
Subjects:
magnetron discharge
acoustoplasma
sputtering technologies
Online Access:http://reffit.tech/index.php/res-eff/article/view/197/183

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http://reffit.tech/index.php/res-eff/article/view/197/183

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