Effects of O<sub>2</sub> Plasma Treatments on the Photolithographic Patterning of PEDOT:PSS

Effects of O<sub>2</sub> Plasma Treatments on the Photolithographic Patterning of PEDOT:PSS

Poly (3,4-ethylenedioxythiophene) polystyrene sulfonate (PEDOT:PSS) is known for its potential to replace indium–tin oxide in various devices. Herein, when fabricating finger-type PEDOT:PSS electrodes using conventional photolithography, the cross-sectional profiles of the patterns are U-shaped inst...

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Bibliographic Details
Main Authors: Deng-Yun Zheng, Meng-Hsiang Chang, Ci-Ling Pan, Masahito Oh-e
Format: Article
Language:English
Published: MDPI AG 2021-12-01
Series:Coatings
Subjects:
microfabrication
photolithography
patterning
PEDOT:PSS
plasma
thickness
Online Access:https://www.mdpi.com/2079-6412/11/1/31

Internet

https://www.mdpi.com/2079-6412/11/1/31

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