Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport Technique

The effect of the gaseous atmosphere in the growth of gallium arsenide (GaAs) films was studied. The films have been grown by close-spaced vapor transport (CSVT) technique in a home-made hot filament chemical vapor deposition (HFCVD) reactor using molecular hydrogen and molecular nitrogen as the tra...

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Main Authors: J. Jesús Cruz Bueno, Godofredo García Salgado, R. Fabiola Balderas Valadez, J. Alberto Luna López, F. Gabriela Nieto Caballero, Tomás Díaz Becerril, Enrique Rosendo Andrés, Antonio Coyopol Solís, Román Romano Trujillo, Crisóforo Morales Ruiz, J. Miguel Gracia Jiménez, Reina Galeazzi Isasmendi
Format: Article
Language:English
Published: MDPI AG 2019-01-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/9/2/68
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spelling doaj-85f851ad7a9c43c3977b7d413e1906992020-11-25T01:14:20ZengMDPI AGCrystals2073-43522019-01-01926810.3390/cryst9020068cryst9020068Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport TechniqueJ. Jesús Cruz Bueno0Godofredo García Salgado1R. Fabiola Balderas Valadez2J. Alberto Luna López3F. Gabriela Nieto Caballero4Tomás Díaz Becerril5Enrique Rosendo Andrés6Antonio Coyopol Solís7Román Romano Trujillo8Crisóforo Morales Ruiz9J. Miguel Gracia Jiménez10Reina Galeazzi Isasmendi11IC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoFCQ Benemérita Universidad Autónoma de Puebla, Ed. FCQ4, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoIFUAP, Benemérita Universidad Autónoma de Puebla, Ed. IF2, Col. San Manuel, Puebla C.P. 72570, MexicoIC-CIDS Benemérita Universidad Autónoma de Puebla, Ed. IC5, Col. San Manuel, Puebla C.P. 72570, MexicoThe effect of the gaseous atmosphere in the growth of gallium arsenide (GaAs) films was studied. The films have been grown by close-spaced vapor transport (CSVT) technique in a home-made hot filament chemical vapor deposition (HFCVD) reactor using molecular hydrogen and molecular nitrogen as the transport agent. An important point about the gaseous atmosphere is the ease in creating volatile compounds when it makes contact with the GaAs source, this favors the transport of material in a CSVT system. Chemical reactions are proposed in order to understand the significant difference produced from the gaseous atmosphere. The films grown with hydrogen are (almost) continuous and have homogeneous layers with preferential orientation (111). The films grown with nitrogen are granular and rough layers with the coexistence of the orientations (111), (220) and (311) in the crystals. The incorporation of impurities in the films was corroborated by energy dispersive spectroscopy (EDS) showing traces of oxygen and nitrogen for the case of the samples obtained with nitrogen. Films grown in a hydrogen atmosphere show a higher band gap than those grown in a nitrogen atmosphere. With the results of XRD and micro-Raman we observe a displacement and broadening of the peaks, characteristic of a structural disorder. The calculations of the FWHM allow us to observe the crystallinity degree and determine an approximate crystallite size using the Scherrer’s equation.https://www.mdpi.com/2073-4352/9/2/68CSVTHFCVDGaAsfilms
collection DOAJ
language English
format Article
sources DOAJ
author J. Jesús Cruz Bueno
Godofredo García Salgado
R. Fabiola Balderas Valadez
J. Alberto Luna López
F. Gabriela Nieto Caballero
Tomás Díaz Becerril
Enrique Rosendo Andrés
Antonio Coyopol Solís
Román Romano Trujillo
Crisóforo Morales Ruiz
J. Miguel Gracia Jiménez
Reina Galeazzi Isasmendi
spellingShingle J. Jesús Cruz Bueno
Godofredo García Salgado
R. Fabiola Balderas Valadez
J. Alberto Luna López
F. Gabriela Nieto Caballero
Tomás Díaz Becerril
Enrique Rosendo Andrés
Antonio Coyopol Solís
Román Romano Trujillo
Crisóforo Morales Ruiz
J. Miguel Gracia Jiménez
Reina Galeazzi Isasmendi
Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport Technique
Crystals
CSVT
HFCVD
GaAs
films
author_facet J. Jesús Cruz Bueno
Godofredo García Salgado
R. Fabiola Balderas Valadez
J. Alberto Luna López
F. Gabriela Nieto Caballero
Tomás Díaz Becerril
Enrique Rosendo Andrés
Antonio Coyopol Solís
Román Romano Trujillo
Crisóforo Morales Ruiz
J. Miguel Gracia Jiménez
Reina Galeazzi Isasmendi
author_sort J. Jesús Cruz Bueno
title Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport Technique
title_short Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport Technique
title_full Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport Technique
title_fullStr Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport Technique
title_full_unstemmed Effect of the Gaseous Atmosphere in GaAs Films Grown by Close-Spaced Vapor Transport Technique
title_sort effect of the gaseous atmosphere in gaas films grown by close-spaced vapor transport technique
publisher MDPI AG
series Crystals
issn 2073-4352
publishDate 2019-01-01
description The effect of the gaseous atmosphere in the growth of gallium arsenide (GaAs) films was studied. The films have been grown by close-spaced vapor transport (CSVT) technique in a home-made hot filament chemical vapor deposition (HFCVD) reactor using molecular hydrogen and molecular nitrogen as the transport agent. An important point about the gaseous atmosphere is the ease in creating volatile compounds when it makes contact with the GaAs source, this favors the transport of material in a CSVT system. Chemical reactions are proposed in order to understand the significant difference produced from the gaseous atmosphere. The films grown with hydrogen are (almost) continuous and have homogeneous layers with preferential orientation (111). The films grown with nitrogen are granular and rough layers with the coexistence of the orientations (111), (220) and (311) in the crystals. The incorporation of impurities in the films was corroborated by energy dispersive spectroscopy (EDS) showing traces of oxygen and nitrogen for the case of the samples obtained with nitrogen. Films grown in a hydrogen atmosphere show a higher band gap than those grown in a nitrogen atmosphere. With the results of XRD and micro-Raman we observe a displacement and broadening of the peaks, characteristic of a structural disorder. The calculations of the FWHM allow us to observe the crystallinity degree and determine an approximate crystallite size using the Scherrer’s equation.
topic CSVT
HFCVD
GaAs
films
url https://www.mdpi.com/2073-4352/9/2/68
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