Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces

Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces

The different cleaning solution; HCl and HF solution are used to remove the suboxide and oxide component on Ge surface. The HCl cleaning results chlorine (Cl) termination on Ge surface whereas no Fluorine (F) termination was observed just after HF cleaning. The growth of Ge oxide is studied after tr...

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Bibliographic Details
Main Authors: Sahari Siti Kudnie, Kashif Muhammad, Sawawi Marini, Nik Zaini Fathi Nik Amni Fathi, Hamzah Azrul Azlan, Majlis Burhanuddin Yeop, Sutan Norsuzailina Muhammad, Sapawi Rohana, Kipli Kuryati, Abdul Halim Nurul Atiqah, Junaidi Nazreen, Wan Masra Sharifah Masniah
Format: Article
Language:English
Published: EDP Sciences 2017-01-01
Series:MATEC Web of Conferences
Online Access:https://doi.org/10.1051/matecconf/20178705005

Internet

https://doi.org/10.1051/matecconf/20178705005

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