Copper Oxide Films Deposited by Microwave Assisted Alkaline Chemical Bath

Copper Oxide Films Deposited by Microwave Assisted Alkaline Chemical Bath

Copper oxide (CuO) films were deposited onto glass substrates by the microwave assisted chemical bath deposition method, and varying the pH of the solution. The pH range was varied from 11.0 to 13.5, and the effects on the film properties were studied. An analytical study of the precursor solution w...

Full description

Bibliographic Details
Main Authors: Reina Galeazzi Isasmendi, Isidro Juvenal Gonzalez Panzo, Crisóforo Morales-Ruiz, Román Romano Trujillo, Enrique Rosendo, Iván García, Antonio Coyopol, Godofredo García-Salgado, Rutilo Silva-González, Iván Oliva Arias, Carolina Tabasco Novelo
Format: Article
Language:English
Published: MDPI AG 2021-08-01
Series:Crystals
Subjects:
semiconductors
precipitation
growth processes
nanostructures
characterization
Online Access:https://www.mdpi.com/2073-4352/11/8/968

Internet

https://www.mdpi.com/2073-4352/11/8/968

Similar Items