Fabrication of polyimide sacrificial layers with inclined sidewalls based on reactive ion etching
Polyimide is used as a sacrificial material because of its low stress, its removable ability and its compatibility with standard micromachining processes. In this work, polyimide structures with inclined sidewalls are fabricated with a reactive ion etching process, where SiO2 is used as the hard-mas...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2014-03-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4868379 |