Multiscale Modeling of Chemical Vapor Deposition (CVD) Apparatus: Simulations and Approximations

Multiscale Modeling of Chemical Vapor Deposition (CVD) Apparatus: Simulations and Approximations

We are motivated to compute delicate chemical vapor deposition (CVD) processes. Such processes are used to deposit thin films of metallic or ceramic materials, such as SiC or a mixture of SiC and TiC. For practical simulations and for studying the characteristics in the deposition area, we have to d...

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Bibliographic Details
Main Author: Juergen Geiser
Format: Article
Language:English
Published: MDPI AG 2013-02-01
Series:Polymers
Subjects:
numerical methods
CVD processes
regression method
iteration process
optimization
computable models
Online Access:http://www.mdpi.com/2073-4360/5/1/142

Internet

http://www.mdpi.com/2073-4360/5/1/142

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