Application of the Metal Reflector for Redistributing the Focusing Intensity of SPPs
The<b> </b>near-field photolithography system has attracted increasing attention in the micro- and nano-manufacturing field, due to the high efficiency, high resolution, and the low cost of the scheme. Nevertheless, the low quality of the nano-patterns significantly limits the industrial...
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-05-01
|
| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/10/5/937 |