SiN/SiO2 passivation stack of n-type silicon surface

SiN/SiO2 passivation stack of n-type silicon surface

The SiN/SiO2 stack is widely used to passivate the surface of n-type monocrystalline silicon solar cells. In this work, we have undertaken a study to compare the stack layer obtained with SiO2 grown by both rapid thermal and chemical ways to passivate n-type monocrystalline silicon surface. By varyi...

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Bibliographic Details
Main Authors: El Amrani A., Si-Kaddour R., Maoudj M., Nasraoui C.
Format: Article
Language:English
Published: Sciendo 2019-09-01
Series:Materials Science-Poland
Subjects:
silicon
passivation
silicon nitride
oxide
Online Access:https://doi.org/10.2478/msp-2019-0065

Internet

https://doi.org/10.2478/msp-2019-0065

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