Effect of Oxide Layer in Metal-Oxide-Semiconductor Systems

In this work, we investigate the electrical properties of oxide layer in the metal-oxide semiconductor field effect transistor (MOSFET). The thickness of oxide layer is proportional to square root of oxidation time. The feature of oxide layer thickness on the growth time is consistent with the Deal-...

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Bibliographic Details
Main Authors: Fan Jung-Chuan, Lee Shih-Fong
Format: Article
Language:English
Published: EDP Sciences 2016-01-01
Series:MATEC Web of Conferences
Online Access:http://dx.doi.org/10.1051/matecconf/20166706103