Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition

Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition

Plasma-enhanced atomic layer deposition (PEALD) is a widely used, powerful layer-by-layer coating technology. Here, we present an atomistic simulation scheme for PEALD processes, combining the Monte Carlo deposition algorithm and structure relaxation using molecular dynamics. In contrast to previous...

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Bibliographic Details
Main Authors: Martin Becker, Marek Sierka
Format: Article
Language:English
Published: MDPI AG 2019-08-01
Series:Materials
Subjects:
plasma-enhanced atomic layer deposition
Monte Carlo simulation
molecular dynamics simulations
density functional theory
ReaxFF reactive force field
Online Access:https://www.mdpi.com/1996-1944/12/16/2605

Internet

https://www.mdpi.com/1996-1944/12/16/2605

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