Raman Analysis of E<sub>2 </sub>(High) and A<sub>1 </sub>(LO) Phonon to the Stress-Free GaN Grown on Sputtered AlN/Graphene Buffer Layer
The realization of high-speed and high-power gallium nitride (GaN)-based devices using high-quality GaN/Aluminum nitride (AlN) materials has become a hot topic. Raman spectroscopy has proven to be very useful in analyzing the characteristics of wide band gap materials, which reveals the information...
Main Authors: | , , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-12-01
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Series: | Applied Sciences |
Subjects: | |
Online Access: | https://www.mdpi.com/2076-3417/10/24/8814 |