Kelvin probe force microscopy for local characterisation of active nanoelectronic devices

Frequency modulated Kelvin probe force microscopy (FM-KFM) is the method of choice for high resolution measurements of local surface potentials, yet on coarse topographic structures most researchers revert to amplitude modulated lift-mode techniques for better stability. This approach inevitably tra...

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Bibliographic Details
Main Authors: Tino Wagner, Hannes Beyer, Patrick Reissner, Philipp Mensch, Heike Riel, Bernd Gotsmann, Andreas Stemmer
Format: Article
Language:English
Published: Beilstein-Institut 2015-11-01
Series:Beilstein Journal of Nanotechnology
Subjects:
Online Access:https://doi.org/10.3762/bjnano.6.225