Focused Ion Beam nano-patterning from traditional applications to single ion implantation perspectives

Focused Ion Beam nano-patterning from traditional applications to single ion implantation perspectives

In this article we review some fundamentals of the Focused Ion Beam (FIB) technique based on scanning finely focused beams of gallium ions over a sample to perform direct writing. We analyse the main limitations of this technique in terms of damage generation or local contamination and through selec...

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Bibliographic Details
Main Author: Gierak Jacques
Format: Article
Language:English
Published: De Gruyter 2014-01-01
Series:Nanofabrication
Subjects:
FIB
Ga ions-solid interactions
nanofabrication
Online Access:http://www.degruyter.com/view/j/nanofab.2014.1.issue-1/nanofab-2014-0004/nanofab-2014-0004.xml?format=INT

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