Multidirectional UV-LED lithography using an array of high-intensity UV-LEDs and tilt-rotational sample holder for 3-D microfabrication

Multidirectional UV-LED lithography using an array of high-intensity UV-LEDs and tilt-rotational sample holder for 3-D microfabrication

Abstract This paper presents a computer-controlled multidirectional UV-LED lithography system for 3-D microfabrication. The presented UV-LED system has adopted adjustable or programmable high-intensity UV-LEDs as a light source enabling for photopatterning both thin and thick SU-8 photoresist proces...

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Bibliographic Details
Main Authors: Sabera Fahmida Shiba, Jun Ying Tan, Jungkwun Kim
Format: Article
Language:English
Published: SpringerOpen 2020-04-01
Series:Micro and Nano Systems Letters
Subjects:
UV-LED lithography
3D microfabrication
Millimeter thick photoresist process
Online Access:http://link.springer.com/article/10.1186/s40486-020-00107-y

Internet

http://link.springer.com/article/10.1186/s40486-020-00107-y

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