Thin Dielectric Spacer for the Monolithic Integration of Bulk Germanium or Germanium Quantum Wells With Silicon-on-Insulator Waveguides
We propose an approach to monolithically integrate bulk germanium (Ge) or Ge quantum wells with silicon-on-insulator (SOI) waveguides through selective epitaxy and direct butt coupling. To prevent lateral epitaxial growth during the selective epitaxy, a dielectric insulating spacer layer is deposite...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
IEEE
2011-01-01
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Series: | IEEE Photonics Journal |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/5982074/ |