Faraday-cage-assisted etching of suspended gallium nitride nanostructures
We have developed an inductively coupled plasma etching technique using a Faraday cage to create suspended gallium-nitride devices in a single step. The angle of the Faraday cage, gas mix, and chamber condition define the angle of the etch and the cross-sectional profile, which can feature undercut...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2020-05-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0007947 |