Low-energy SiC2H6+ and SiC3H9+ ion beam productions by the mass-selection of fragments produced from hexamethyldisilane for SiC film formations

We have been attempting to produce low-energy ion beams from fragments produced through the decomposition of hexamethyldisilane (HMD) for silicon carbide (SiC) film formations. We mass-selected SiC2H6+ and SiC3H9+ ions from fragments produced from HMD, and finally produced low-energy SiC2H6+ and SiC...

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Bibliographic Details
Main Authors: Satoru Yoshimura, Satoshi Sugimoto, Kensuke Murai, Masato Kiuchi
Format: Article
Language:English
Published: AIP Publishing LLC 2016-12-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4972206