Concept model of atomic hydrogen dry developing process for photolithographic patterning
Atomic hydrogen dry etching was used for microstructure fabrication. Photolithography was proposed and achieved by a dry development process using atomic hydrogen irradiation. The reaction system of poly(methyl methacrylate) mixed with molecular benzophenone was examined as a model system for a proo...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2020-10-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0027509 |
| Summary: | Atomic hydrogen dry etching was used for microstructure fabrication. Photolithography was proposed and achieved by a dry development process using atomic hydrogen irradiation. The reaction system of poly(methyl methacrylate) mixed with molecular benzophenone was examined as a model system for a proof-of-concept study. Optical patterning was experimentally made on a thin layer of poly(methyl methacrylate) with benzophenone by UV light exposure with a photomask. The reaction system acted as a negative tone resist in the proposed process. Thus, a model system for a new atomic hydrogen dry development process was proposed and successfully demonstrated. |
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| ISSN: | 2158-3226 |