Study of Inverse Lithography Approaches based on Deep Learning

Study of Inverse Lithography Approaches based on Deep Learning

Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively improve the degrees of optimization freedom. Howe...

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Bibliographic Details
Main Authors: Xianqiang Zheng, Xu Ma, Shengen Zhang, Yihua Pan, Gonzalo R. Arce
Format: Article
Language:English
Published: JommPublish 2020-10-01
Series:Journal of Microelectronic Manufacturing
Subjects:
computational lithography
inverse lithography technology (ilt)
optical proximity correction (opc)
deep learning
Online Access:http://www.jommpublish.org/p/55/

Internet

http://www.jommpublish.org/p/55/

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