Fabrication of a high-speed plasmonic reflection/transmission modulator
The fabrication of a high-speed plasmonic reflection/transmission modulator for operation at λ0 = 1550 nm is presented and described in detail. Front-side ground and signal contacts provide easy electrical probe access to the device, while allowing the transmission of light through the substrate. Mo...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2021-02-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/6.0000629 |