Effect of nitrogen-doping on the surface chemistry and corrosion stability of TiO2 films
TiO2 and N-doped TiO2 films were grown on AISI 316 stainless steel substrates and on Si (100) by metallorganic chemical vapor deposition (MOCVD) at 400 °C and 500 °C. X-ray photoelectron spectroscopy, scanning electron microscopy, and contact angle techniques were used to characterize de films. The...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2020-01-01
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| Series: | Journal of Materials Research and Technology |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785419308683 |