Macroparticle Reflection from a Biased Substrtate in Plasma Ion Implantation Systems

Generation of metal plasma in vacuum arc discharge is always accompanied by a production of macroparticles (MPs). The MP contamination in coatings is the most important technological problem in plasma immersion ion implantation (PIII). For the case of PIII with long pulse duration, the results of th...

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Bibliographic Details
Main Authors: Elena V. Romashchenko, Aleksander A. Bizyukov, Igor O. Girka
Format: Article
Language:English
Published: V.N. Karazin Kharkiv National University Publishing 2020-02-01
Series:East European Journal of Physics
Subjects:
Online Access:https://periodicals.karazin.ua/eejp/article/view/15446