Preparation and thermal volatility characteristics of In2O3/ITO thin film thermocouple by RF magnetron sputtering

Preparation and thermal volatility characteristics of In2O3/ITO thin film thermocouple by RF magnetron sputtering

In2O3/ITO thin film thermocouples for high temperature measurement (up to 1250 °C) were prepared by radio frequency magnetron sputtering method with different annealing temperatures from 1100 °C to 1250 °C. The changes with microstructure characteristics and the thickness of the thin film thermocoup...

Full description

Bibliographic Details
Main Authors: Yantao Liu, Wei Ren, Peng Shi, Dan Liu, Ming Liu, Weixuan Jing, Bian Tian, Zuoguang Ye, Zhuangde Jiang
Format: Article
Language:English
Published: AIP Publishing LLC 2017-11-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4999246

Similar Items

Similar Items