Coupling and Shielding Properties of the Baffle in ICP System
This contribution is dealing with experimental and computational evaluation of the deposition baffle that is transparent to radio frequency (RF) magnetic fields generated by an external antenna in an inductively coupled plasma (ICP) source but opaque to the deposition of the metal onto a dielectric...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2011-01-01
|
| Series: | Modelling and Simulation in Engineering |
| Online Access: | http://dx.doi.org/10.1155/2011/541743 |