Study of structural and electrical properties of ferroelectric HZO films obtained by single-target sputtering

Study of structural and electrical properties of ferroelectric HZO films obtained by single-target sputtering

In this work, we study the structural and electrical properties of Hafnium Zirconium Oxide (HZO) thin films deposited by Hf0.5Zr0.5O2 single-target sputtering to fabricate a TiN/(14-/22 nm-thick) HZO/TiN stack. The structural analysis of the HZO thin films performed by in situ x-ray diffraction upon...

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Bibliographic Details
Main Authors: M. B. Hachemi, B. Salem, V. Consonni, H. Roussel, A. Garraud, G. Lefevre, S. Labau, S. Basrour, A. Bsiesy
Format: Article
Language:English
Published: AIP Publishing LLC 2021-08-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0058656

Internet

http://dx.doi.org/10.1063/5.0058656

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