Inner Spacer Engineering to Improve Mechanical Stability in Channel-Release Process of Nanosheet FETs

Mechanical stress is demonstrated in the fabrication process of nanosheet FETs. In particular, unwanted mechanical instability stemming from gravity during channel-release is covered in detail by aid of 3-D simulations. The simulation results show the physical weakness of suspended nanosheets and th...

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Bibliographic Details
Main Authors: Khwang-Sun Lee, Jun-Young Park
Format: Article
Language:English
Published: MDPI AG 2021-06-01
Series:Electronics
Subjects:
Online Access:https://www.mdpi.com/2079-9292/10/12/1395