Pulsed-N2 assisted growth of 5-20 nm thick β-W films

A technique to deposit 5-20 nm thick β-phase W using a 2-second periodic pulse of 1 sccm-N2 gas on Si(001) and SiN(5 nm)/Si(001) substrates is reported. Resistivity, X-ray photoelectron spectroscopy and X-ray reflectivity were utilized to determine phase, bonding and thickness, respectively. X-ray d...

Full description

Bibliographic Details
Main Authors:	Avyaya J. Narasimham, Avery Green, Richard J. Matyi, Prasanna Khare, Tuan Vo, Alain Diebold, Vincent P. LaBella
Format:	Article
Language:	English
Published:	AIP Publishing LLC 2015-11-01
Series:	AIP Advances
Online Access:	http://dx.doi.org/10.1063/1.4935372

id	doaj-4401e3087de944c1a23bb80757f6845c
record_format	Article
spelling	doaj-4401e3087de944c1a23bb80757f6845c2020-11-24T20:43:51ZengAIP Publishing LLCAIP Advances2158-32262015-11-01511117107117107-910.1063/1.4935372011511ADVPulsed-N2 assisted growth of 5-20 nm thick β-W filmsAvyaya J. Narasimham0Avery Green1Richard J. Matyi2Prasanna Khare3Tuan Vo4Alain Diebold5Vincent P. LaBella6College of Nanoscale Science and Engineering, University at Albany, SUNY, Albany, New York 12203, USACollege of Nanoscale Science and Engineering, University at Albany, SUNY, Albany, New York 12203, USACollege of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, New York 12203, USACollege of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, New York 12203, USACollege of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, New York 12203, USACollege of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, New York 12203, USACollege of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, New York 12203, USAA technique to deposit 5-20 nm thick β-phase W using a 2-second periodic pulse of 1 sccm-N2 gas on Si(001) and SiN(5 nm)/Si(001) substrates is reported. Resistivity, X-ray photoelectron spectroscopy and X-ray reflectivity were utilized to determine phase, bonding and thickness, respectively. X-ray diffraction patterns were utilized to determine the crystal structure, lattice constant and crystal size using the LeBail method. The flow rate of Nitrogen gas (continuous vs. pulsing) had significant impact upon the crystallinity and formation of β-phase W.http://dx.doi.org/10.1063/1.4935372
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Avyaya J. Narasimham Avery Green Richard J. Matyi Prasanna Khare Tuan Vo Alain Diebold Vincent P. LaBella
spellingShingle	Avyaya J. Narasimham Avery Green Richard J. Matyi Prasanna Khare Tuan Vo Alain Diebold Vincent P. LaBella Pulsed-N2 assisted growth of 5-20 nm thick β-W films AIP Advances
author_facet	Avyaya J. Narasimham Avery Green Richard J. Matyi Prasanna Khare Tuan Vo Alain Diebold Vincent P. LaBella
author_sort	Avyaya J. Narasimham
title	Pulsed-N2 assisted growth of 5-20 nm thick β-W films
title_short	Pulsed-N2 assisted growth of 5-20 nm thick β-W films
title_full	Pulsed-N2 assisted growth of 5-20 nm thick β-W films
title_fullStr	Pulsed-N2 assisted growth of 5-20 nm thick β-W films
title_full_unstemmed	Pulsed-N2 assisted growth of 5-20 nm thick β-W films
title_sort	pulsed-n2 assisted growth of 5-20 nm thick β-w films
publisher	AIP Publishing LLC
series	AIP Advances
issn	2158-3226
publishDate	2015-11-01
description	A technique to deposit 5-20 nm thick β-phase W using a 2-second periodic pulse of 1 sccm-N2 gas on Si(001) and SiN(5 nm)/Si(001) substrates is reported. Resistivity, X-ray photoelectron spectroscopy and X-ray reflectivity were utilized to determine phase, bonding and thickness, respectively. X-ray diffraction patterns were utilized to determine the crystal structure, lattice constant and crystal size using the LeBail method. The flow rate of Nitrogen gas (continuous vs. pulsing) had significant impact upon the crystallinity and formation of β-phase W.
url	http://dx.doi.org/10.1063/1.4935372
work_keys_str_mv	AT avyayajnarasimham pulsedn2assistedgrowthof520nmthickbwfilms AT averygreen pulsedn2assistedgrowthof520nmthickbwfilms AT richardjmatyi pulsedn2assistedgrowthof520nmthickbwfilms AT prasannakhare pulsedn2assistedgrowthof520nmthickbwfilms AT tuanvo pulsedn2assistedgrowthof520nmthickbwfilms AT alaindiebold pulsedn2assistedgrowthof520nmthickbwfilms AT vincentplabella pulsedn2assistedgrowthof520nmthickbwfilms
_version_	1716818742511403008

Pulsed-N2 assisted growth of 5-20 nm thick β-W films

Similar Items