Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum

Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum

The aim of this study is motivated by the pursuit to investigate the performance of new and as yet untested precursors such as hydrazinium chloride (N<sub>2</sub>H<sub>5</sub>Cl) and triisobutylaluminum Al(C<sub>4</sub>H<sub>9</sub>)<sub>3</su...

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Bibliographic Details
Main Authors: Rashid Dallaev, Dinara Sobola, Pavel Tofel, Ľubomir Škvarenina, Petr Sedlák
Format: Article
Language:English
Published: MDPI AG 2020-10-01
Series:Coatings
Subjects:
aluminum nitride
triisobutylaluminum
hydrazinium chloride
atomic layer deposition
atomic force microscopy
X-ray photoelectron spectroscopy
Online Access:https://www.mdpi.com/2079-6412/10/10/954

Internet

https://www.mdpi.com/2079-6412/10/10/954

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