Measurements of the contact angle of Noa81 photoresist for different temperatures
In this work we study the properties of the surface, obtained by applying Noa 81 photoresist at different temperatures of the substrate. The measurement of free energy was conducted by the Owens, Wendt, Rabel and Kaelble method under isothermal conditions. The paper presents the obtained data on con...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2017-01-01
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| Series: | MATEC Web of Conferences |
| Online Access: | http://dx.doi.org/10.1051/matecconf/20179201042 |