CuAlO2 and CuAl2O4 thin films obtained by stacking Cu and Al films using physical vapor deposition
CuAlO2 and CuAl2O4 thin films were synthesized by the deposition of the precursor metals using the physical vapor deposition technique and subsequent annealing. Annealing was carried out for 4–6 h in open and nitrogen atmospheres respectively at temperatures of 900–1000 °C with control of heating an...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2018-06-01
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| Series: | Results in Physics |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2211379717323550 |