Electromigration analysis of FinFET self-heating

In advanced node, FinFET processes provide power, performance, and area benefits over planar technologies. But a vexing problem aggravated by FinFET is the greater local device current density, which translates to an increased concern for signal and power rail metal electromigration reliability fail...

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Bibliographic Details
Main Authors: Zhang Xiaojun, Ji Hao, Nie Bijian
Format: Article
Language:zho
Published: National Computer System Engineering Research Institute of China 2019-08-01
Series:Dianzi Jishu Yingyong
Subjects:
Online Access:http://www.chinaaet.com/article/3000107393

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