Simulation of electron transfer processes in a semiconductor structure using graphene and boron nitride

This paper presents the results of simulating the electron transfer processes in a three-dimensional semiconductor structure containing graphene and layers of boron hexagonal nitride using the Monte – Carlo method. Graphene is currently considered one of the most promising materials for the creation...

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Bibliographic Details
Main Authors: V. V. Muravyov, V. N. Mishchenka
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2020-11-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:
Online Access:https://doklady.bsuir.by/jour/article/view/2902