In-Situ Plasma Monitoring during the Pulsed Laser Deposition of Ni<sub>60</sub>Ti<sub>40</sub> Thin Films

In-Situ Plasma Monitoring during the Pulsed Laser Deposition of Ni<sub>60</sub>Ti<sub>40</sub> Thin Films

The properties of pulsed laser deposited of Ni<sub>60</sub>Ti<sub>40</sub> shape memory thin films generated in various deposition conditions were investigated. In-situ plasma monitoring was implemented by means of space- and time-resolved optical emission spectroscopy, and I...

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Bibliographic Details
Main Authors: Nicanor Cimpoesu, Silviu Gurlui, Georgiana Bulai, Ramona Cimpoesu, Viorel-Puiu Paun, Stefan Andrei Irimiciuc, Maricel Agop
Format: Article
Language:English
Published: MDPI AG 2020-01-01
Series:Symmetry
Subjects:
nitinol
pulsed laser deposition
in situ plasma monitoring
thin films
fractal modelling
sl(2r) invariance
homographic transformations
riccati equation
Online Access:https://www.mdpi.com/2073-8994/12/1/109

Internet

https://www.mdpi.com/2073-8994/12/1/109

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