Electroluminescence Devices Based on Si Quantum Dots/SiC Multilayers Embedded in PN Junction

We deposited a p-i-n structure device with alternative amorphous Si (a-Si) and amorphous SiC (a-SiC) multilayers as an intrinsic layer in a plasma-enhanced chemical vapor deposition (PECVD) system. A KrF pulsed excimer laser-induced crystallization of a-Si/a-SiC stacked structures was used to prepar...

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Bibliographic Details
Main Authors: X. Xu, Y. Q. Cao, P. Lu, J. Xu, W. Li, K. J. Chen
Format: Article
Language:English
Published: IEEE 2014-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/6690105/