Fluid simulation of the plasma uniformity in new multi-directional source capacitively coupled plasma

A 2D drift diffusion fluid model was employed to study the plasma uniformity of different capacitively coupled plasma (CCP) in argon discharges based on the COMSOL platform. The numerical results show that compared with the traditional CCP device that discharges between plates, the plasma uniformity...

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Bibliographic Details
Main Authors: Wenchong Ouyang, Chengbiao Ding, Qi Liu, Shuzhan Gao, Weifeng Deng, Zhengwei Wu
Format: Article
Language:English
Published: AIP Publishing LLC 2021-07-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0062272