Magnetic Resonance Lithography with Nanometer Resolution
We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of produci...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2016-04-01
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| Series: | Technologies |
| Subjects: | |
| Online Access: | http://www.mdpi.com/2227-7080/4/2/12 |