Self-assembly of Blended PS-b-P2VP Block Copolymers
Directed Self-Assembly (DSA) of block copolymers (BCPs) is a promising technique for sub-10 nm nanofabrication, which is highly compatible with conventional lithography. DSA relies on the microphase separation of block copolymers to form nanostructures of different morphologies. The pitch size of th...
Main Authors: | Baolin Zhang, Yu Chen, Shisheng Xiong |
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Format: | Article |
Language: | English |
Published: |
JommPublish
2019-12-01
|
Series: | Journal of Microelectronic Manufacturing |
Subjects: | |
Online Access: | http://www.jommpublish.org/p/38/# |
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