Self-assembly of Blended PS-b-P2VP Block Copolymers

Self-assembly of Blended PS-b-P2VP Block Copolymers

Directed Self-Assembly (DSA) of block copolymers (BCPs) is a promising technique for sub-10 nm nanofabrication, which is highly compatible with conventional lithography. DSA relies on the microphase separation of block copolymers to form nanostructures of different morphologies. The pitch size of th...

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Bibliographic Details
Main Authors: Baolin Zhang, Yu Chen, Shisheng Xiong
Format: Article
Language:English
Published: JommPublish 2019-12-01
Series:Journal of Microelectronic Manufacturing
Subjects:
micro-phase
blending
lamellar pattern
solvent annealing
sequential infiltration synthesis
Online Access:http://www.jommpublish.org/p/38/#

Internet

http://www.jommpublish.org/p/38/#

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