Atomic layer deposition enabling higher efficiency solar cells: A review

• Main Authors: Md. Anower Hossain, Kean Thong Khoo, Xin Cui, Geedhika K Poduval, Tian Zhang, Xiang Li, Wei Min Li, Bram Hoex
• Format: Article
• Language: English
• Published: KeAi Communications Co., Ltd. 2020-09-01
• Series: Nano Materials Science
• Subjects: Atomic layer deposition; Transition metal oxides; Solar cells; Contact resistivity; Surface passivation; Carrier selectivity
• Online Access: http://www.sciencedirect.com/science/article/pii/S2589965119300662

Atomic layer deposition (ALD) can synthesise materials with atomic-scale precision. The ability to tune the material composition, film thickness with excellent conformality, allow low-temperature processing, and in-situ real-time monitoring makes this technique very appealing for a wide range of applications. In this review, we focus on the application of ALD layers in a wide range of solar cells. We focus on industrial silicon, thin film, organic and quantum dot solar cells. It is shown that the merits of ALD have already been exploited in a wide range of solar cells at the lab scale and that ALD is already applied in high-volume manufacturing of silicon solar cells.