The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2013-02-01
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| Series: | Open Physics |
| Subjects: | |
| Online Access: | https://doi.org/10.2478/s11534-012-0166-0 |