Multiscale Computational Fluid Dynamics: Methodology and Application to PECVD of Thin Film Solar Cells

• Main Authors: Marquis Crose, Anh Tran, Panagiotis D. Christofides
• Format: Article
• Language: English
• Published: MDPI AG 2017-02-01
• Series: Coatings
• Subjects: multiscale modeling; plasma-enhanced chemical vapor deposition; computational fluid dynamics; thin film solar cells; parallel computing
• Online Access: http://www.mdpi.com/2079-6412/7/2/22

This work focuses on the development of a multiscale computational fluid dynamics (CFD) simulation framework with application to plasma-enhanced chemical vapor deposition of thin film solar cells. A macroscopic, CFD model is proposed which is capable of accurately reproducing plasma chemistry and transport phenomena within a 2D axisymmetric reactor geometry. Additionally, the complex interactions that take place on the surface of a-Si:H thin films are coupled with the CFD simulation using a novel kinetic Monte Carlo scheme which describes the thin film growth, leading to a multiscale CFD model. Due to the significant computational challenges imposed by this multiscale CFD model, a parallel computation strategy is presented which allows for reduced processing time via the discretization of both the gas-phase mesh and microscopic thin film growth processes. Finally, the multiscale CFD model has been applied to the PECVD process at industrially relevant operating conditions revealing non-uniformities greater than 20% in the growth rate of amorphous silicon films across the radius of the wafer.