Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology

Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology

Aimed at the problem of the small wet etching depth in sapphire microstructure processing technology, a multilayer composite mask layer is proposed. The thickness of the mask layer is studied, combined with the corrosion rate of different materials on sapphire in the sapphire etching solution, diffe...

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Bibliographic Details
Main Authors: Yiingqi Shang, Hongquan Zhang, Yan Zhang
Format: Article
Language:English
Published: MDPI AG 2021-01-01
Series:Micromachines
Subjects:
wet etching
sapphire
mask layer
Online Access:https://www.mdpi.com/2072-666X/12/2/136
id doaj-258ad76ea06b4d5d9d425151614a9731
record_format Article
spelling doaj-258ad76ea06b4d5d9d425151614a97312021-01-28T00:05:36ZengMDPI AGMicromachines2072-666X2021-01-011213613610.3390/mi12020136Research on Sapphire Deep Cavity Corrosion and Mask Selection TechnologyYiingqi Shang0Hongquan Zhang1Yan Zhang2Electronic Science and Technology, College of Electronic Engineering, Heilongjiang University, Harbin 150001, ChinaElectronic Science and Technology, College of Electronic Engineering, Heilongjiang University, Harbin 150001, ChinaThe 49th Research Institute, China Electronics Technology Group Corporation, Harbin 150001, ChinaAimed at the problem of the small wet etching depth in sapphire microstructure processing technology, a multilayer composite mask layer is proposed. The thickness of the mask layer is studied, combined with the corrosion rate of different materials on sapphire in the sapphire etching solution, different mask layers are selected for the corrosion test on the sapphire sheet, and then the corrosion experiment is carried out. The results show that at 250 °C, the choice is relatively high when PECVD (Plasma Enhanced Chemical Vapor Deposition) is used to make a double-layer composite film of silicon dioxide and silicon nitride. When the temperature rises to 300 °C, the selection ratio of the silicon dioxide layer grown by PECVD is much greater than that of the silicon nitride layer. Therefore, under high temperature conditions, a certain thickness of silicon dioxide can be used as a mask layer for deep cavity corrosion.https://www.mdpi.com/2072-666X/12/2/136wet etchingsapphiremask layer
collection DOAJ
language English
format Article
sources DOAJ
author Yiingqi Shang
Hongquan Zhang
Yan Zhang
spellingShingle Yiingqi Shang
Hongquan Zhang
Yan Zhang
Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology
Micromachines
wet etching
sapphire
mask layer
author_facet Yiingqi Shang
Hongquan Zhang
Yan Zhang
author_sort Yiingqi Shang
title Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology
title_short Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology
title_full Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology
title_fullStr Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology
title_full_unstemmed Research on Sapphire Deep Cavity Corrosion and Mask Selection Technology
title_sort research on sapphire deep cavity corrosion and mask selection technology
publisher MDPI AG
series Micromachines
issn 2072-666X
publishDate 2021-01-01
description Aimed at the problem of the small wet etching depth in sapphire microstructure processing technology, a multilayer composite mask layer is proposed. The thickness of the mask layer is studied, combined with the corrosion rate of different materials on sapphire in the sapphire etching solution, different mask layers are selected for the corrosion test on the sapphire sheet, and then the corrosion experiment is carried out. The results show that at 250 °C, the choice is relatively high when PECVD (Plasma Enhanced Chemical Vapor Deposition) is used to make a double-layer composite film of silicon dioxide and silicon nitride. When the temperature rises to 300 °C, the selection ratio of the silicon dioxide layer grown by PECVD is much greater than that of the silicon nitride layer. Therefore, under high temperature conditions, a certain thickness of silicon dioxide can be used as a mask layer for deep cavity corrosion.
topic wet etching
sapphire
mask layer
url https://www.mdpi.com/2072-666X/12/2/136
work_keys_str_mv AT yiingqishang researchonsapphiredeepcavitycorrosionandmaskselectiontechnology
AT hongquanzhang researchonsapphiredeepcavitycorrosionandmaskselectiontechnology
AT yanzhang researchonsapphiredeepcavitycorrosionandmaskselectiontechnology
_version_ 1724320186751778816

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