| Summary: | Nowadays, cluster tools tend to concurrently process multiple types of wafers with similar recipes in order to improve their utilization and flexibility in semiconductor manufacturing. Different wafer types may have different wafer flow patterns, resulting in that cluster tools are deadlock-prone. It is challenging to develop a general method to solve the deadlock problem of cluster tools without restriction on the wafer types. This work aims at solving such a challenging problem for single-arm cluster tools. To do so, a general Petri net model is developed for single-arm cluster tools. Given the wafer flow patterns of all wafer types to be processed in a single-arm cluster tool, such a Petri net model can be easily obtained by defining the relationship between places and transitions. Then, a control method by using self-loops is presented to prevent the model from deadlocks during the evolutions from the initial state to the final state. Furthermore, such a control method is proved to be optimal. Illustrative examples are given to verify the proposed method at last.
|
|---|
