Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting Diodes
The hole injection efficiency is one of the bottlenecks that restrict the external quantum efficiency (EQE) and optical power of AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs). The polarization-induced positive sheet charges at the last quantum barrier (LQB)/electron blocki...
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doaj-21a9e27389f44b3e82f22d886c94e6f62021-09-09T23:00:05ZengIEEEIEEE Photonics Journal1943-06552021-01-011341810.1109/JPHOT.2021.31014809506897Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting DiodesMengran Liu0https://orcid.org/0000-0002-6466-9112Yongchen Ji1Hang Zhou2Changsheng Xia3Zihui Zhang4Chao Liu5https://orcid.org/0000-0001-6368-3986School of Microelectronics, Institute of Novel Semiconductors, Shandong Technology Center of Nanodevices and Integration, State Key Laboratory of Crystal Materials, Shandong University, Jinan, ChinaSchool of Microelectronics, Institute of Novel Semiconductors, Shandong Technology Center of Nanodevices and Integration, State Key Laboratory of Crystal Materials, Shandong University, Jinan, ChinaSchool of Microelectronics, Institute of Novel Semiconductors, Shandong Technology Center of Nanodevices and Integration, State Key Laboratory of Crystal Materials, Shandong University, Jinan, ChinaSinopeda Technology Company Ltd., Shanghai, ChinaState Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, Hongqiao District, Tianjin, ChinaSchool of Microelectronics, Institute of Novel Semiconductors, Shandong Technology Center of Nanodevices and Integration, State Key Laboratory of Crystal Materials, Shandong University, Jinan, ChinaThe hole injection efficiency is one of the bottlenecks that restrict the external quantum efficiency (EQE) and optical power of AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs). The polarization-induced positive sheet charges at the last quantum barrier (LQB)/electron blocking layer (EBL) interface reflect the holes back to the p-type layer and weaken the hole injection capability into the active region. In this work, we designed and incorporated a polarization-engineered Al<sub>x</sub>Ga<sub>1-x</sub>N/Al<sub>y</sub>Ga<sub>1-y</sub>N superlattice layer at the LQB/EBL interface. The positive sheet charges at the LQB/EBL interface can be inverted into negative charges with optimal Al compositions in the Al<sub>x</sub>Ga<sub>1-x</sub>N/Al<sub>y</sub>Ga<sub>1-y</sub>N superlattice layer. The electron confinement and hole injection efficiency can also be improved through increasing the effective barrier height for electrons and decreasing the effective barrier height for holes, resulting in an enhanced optical power by 29.4% and alleviated efficiency droop by 78.4% for the proposed device with an Al<sub>0.67</sub>Ga<sub>0.33</sub>N/Al<sub>0.7</sub>Ga<sub>0.3</sub>N superlattice insertion layer. The sheet charge engineering method by polarization provides an alternative approach to boost the hole injection efficiency towards an enhanced device performance for DUV LEDs.https://ieeexplore.ieee.org/document/9506897/DUV LEDhole injection efficiencypolarization-induced sheet charges |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Mengran Liu Yongchen Ji Hang Zhou Changsheng Xia Zihui Zhang Chao Liu |
spellingShingle |
Mengran Liu Yongchen Ji Hang Zhou Changsheng Xia Zihui Zhang Chao Liu Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting Diodes IEEE Photonics Journal DUV LED hole injection efficiency polarization-induced sheet charges |
author_facet |
Mengran Liu Yongchen Ji Hang Zhou Changsheng Xia Zihui Zhang Chao Liu |
author_sort |
Mengran Liu |
title |
Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting Diodes |
title_short |
Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting Diodes |
title_full |
Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting Diodes |
title_fullStr |
Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting Diodes |
title_full_unstemmed |
Sheet Charge Engineering Towards an Efficient Hole Injection in 290 nm Deep Ultraviolet Light-Emitting Diodes |
title_sort |
sheet charge engineering towards an efficient hole injection in 290 nm deep ultraviolet light-emitting diodes |
publisher |
IEEE |
series |
IEEE Photonics Journal |
issn |
1943-0655 |
publishDate |
2021-01-01 |
description |
The hole injection efficiency is one of the bottlenecks that restrict the external quantum efficiency (EQE) and optical power of AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs). The polarization-induced positive sheet charges at the last quantum barrier (LQB)/electron blocking layer (EBL) interface reflect the holes back to the p-type layer and weaken the hole injection capability into the active region. In this work, we designed and incorporated a polarization-engineered Al<sub>x</sub>Ga<sub>1-x</sub>N/Al<sub>y</sub>Ga<sub>1-y</sub>N superlattice layer at the LQB/EBL interface. The positive sheet charges at the LQB/EBL interface can be inverted into negative charges with optimal Al compositions in the Al<sub>x</sub>Ga<sub>1-x</sub>N/Al<sub>y</sub>Ga<sub>1-y</sub>N superlattice layer. The electron confinement and hole injection efficiency can also be improved through increasing the effective barrier height for electrons and decreasing the effective barrier height for holes, resulting in an enhanced optical power by 29.4% and alleviated efficiency droop by 78.4% for the proposed device with an Al<sub>0.67</sub>Ga<sub>0.33</sub>N/Al<sub>0.7</sub>Ga<sub>0.3</sub>N superlattice insertion layer. The sheet charge engineering method by polarization provides an alternative approach to boost the hole injection efficiency towards an enhanced device performance for DUV LEDs. |
topic |
DUV LED hole injection efficiency polarization-induced sheet charges |
url |
https://ieeexplore.ieee.org/document/9506897/ |
work_keys_str_mv |
AT mengranliu sheetchargeengineeringtowardsanefficientholeinjectionin290nmdeepultravioletlightemittingdiodes AT yongchenji sheetchargeengineeringtowardsanefficientholeinjectionin290nmdeepultravioletlightemittingdiodes AT hangzhou sheetchargeengineeringtowardsanefficientholeinjectionin290nmdeepultravioletlightemittingdiodes AT changshengxia sheetchargeengineeringtowardsanefficientholeinjectionin290nmdeepultravioletlightemittingdiodes AT zihuizhang sheetchargeengineeringtowardsanefficientholeinjectionin290nmdeepultravioletlightemittingdiodes AT chaoliu sheetchargeengineeringtowardsanefficientholeinjectionin290nmdeepultravioletlightemittingdiodes |
_version_ |
1717758811745288192 |