Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by phot...

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Bibliographic Details
Main Authors: Ulrich C. Fischer, Carsten Hentschel, Florian Fontein, Linda Stegemann, Christiane Hoeppener, Harald Fuchs, Stefanie Hoeppener
Format: Article
Language:English
Published: Beilstein-Institut 2014-09-01
Series:Beilstein Journal of Nanotechnology
Subjects:
colloid lithography
contact lithography
near-field
photochemistry
self-assembled silane monolayers
Online Access:https://doi.org/10.3762/bjnano.5.156

Internet

https://doi.org/10.3762/bjnano.5.156

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